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Wet Thermal Oxide

Wet thermal silicon dioxide (SiO₂) grown on both wafer surfaces, from 1,000Å up to 10µm on 100mm, 150mm, and 200mm substrates. Every lot is processed in our U.S. class 100 cleanroom and ships ready to use with a film Certificate of Conformance — no oxidation lead time.
1,630.75 / Lot 65.23 per Wafers × 25.0 1630.75 USD
2,851.25 / Lot 114.05 per Wafers × 25.0 2851.25 USD
1,921.75 / Lot 76.87 per Wafers × 25.0 1921.75 USD
3,275.25 / Lot 131.01 per Wafers × 25.0 3275.25 USD
1,728.25 / Lot 69.13 per Wafers × 25.0 1728.25 USD
6,564.25 / Lot 262.57 per Wafers × 25.0 6564.25 USD
2,136.25 / Lot 85.45 per Wafers × 25.0 2136.25 USD
1,921.75 / Lot 76.87 per Wafers × 25.0 1921.75 USD
1,921.75 / Lot 76.87 per Wafers × 25.0 1921.75 USD
2,479.00 / Lot 99.16 per Wafers × 25.0 2479.0 USD

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